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发明名称
Improved photomask for semiconductor fabrication
摘要
申请公布号
EP0590627(B1)
申请公布日期
2001.01.03
申请号
EP19930115697
申请日期
1993.09.29
申请人
TEXAS INSTRUMENTS INCORPORATED
发明人
CHO, SONGSU
分类号
G03F1/00;(IPC1-7):G03F1/14
主分类号
G03F1/00
代理机构
代理人
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地址
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