Fabrication of uniform areal sensitivity image array

摘要

A method for forming an image array optoelectronic microelectronic fabrication. There is first provided a substrate. There is then formed at least in part over the substrate in a plane parallel to the substrate a bidirectional array of active image array optoelectronic microelectronic pixel elements. There is also formed over the substrate in the plane parallel to the substrate and contiguously extending from the bidirectional array of active image array optoelectronic microelectronic pixel elements an annular array of buffer image array optoelectronic microelectronic pixel elements. The annular array of buffer image array optoelectronic microelectronic pixel elements provides for uniform areal sensitivity of the bidirectional array of active image array optoelectronic microelectronic pixel elements.