发明名称 Shadow ring and guide for supporting the shadow ring in a chamber
摘要 The invention generally relates to a processing system and related methods that include a chamber, a pedestal disposed in the chamber, a shadow ring and a set of alignment and support tabs which receive and directly align a substrate with a shadow ring, substantially independently of the pedestal. In one aspect of the invention, a shadow ring is provided which includes an upper shielding portion and a lower alignment and support member. The alignment and support member preferably includes one or more alignment and support tabs. A set of lift pins are preferably disposed in the chamber that may align the substrate and shadow ring with the pedestal. At least one pedestal recess may be located in the pedestal to receive the alignment and support tabs when the pedestal is in a raised position and in some instances to align the substrate and shadow ring to the pedestal.
申请公布号 US6168668(B1) 申请公布日期 2001.01.02
申请号 US19980200305 申请日期 1998.11.25
申请人 APPLIED MATERIALS, INC. 发明人 YUDOVSKY JOSEPH
分类号 H01L21/683;H01L21/205;H01L21/68;H01L21/687;(IPC1-7):C23C16/00 主分类号 H01L21/683
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