| 摘要 |
The manufacture of AMLCDs and similar large-area electronic devices includes forming thin-film circuit elements (11, 12, 13, 14) on a substrate (10), with some of the process steps being self-aligned by shadow-masking. An upstanding post (20) is provided at a first area (10a) of the substrate (10) to one side of a second area (10b) where there is to be formed a thin-film circuit element (11), for example a TFT. First and second parts of the circuit element (11), for example, the TFT channel (3') and gate (5a'), are defined by respective first and second angled exposures with beams (61, 62) from the direction of the upstanding post (20) which acts as a shadow mask for part of the second area (10b). A plurality of the upstanding posts (20) may be at least partly retained in the manufactured device, for example, as supports on which a plate (30) is mounted so as to be spaced from the substrate (10). This configuration is particularly useful for the manufacture of AMLCDs and similar flat-panel displays, where the plate (30) and the substrate (10) may form front and back plates of the display device, with a display medium (40) in the spacing defined by the supports (20).
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