发明名称 PHOTOSENSITIVE ELEMENT, PHOTOSENSITIVE ELEMENT ROLL, PROCESS FOR PRODUCING RESIST PATTERN WITH THE SAME, RESIST PATTERN, SUBSTRATE WITH OVERLYING RESIST PATTERN, PROCESS FOR PRODUCING WIRING PATTERN, AND WIRING PATTERN
摘要 <p>A photosensitive element comprising a biaxially oriented polyester film and a supporting film having a layer of a photosensitive resin composition formed on one side thereof, wherein the supporting film has a resin layer containing fine particles on the side opposite to the photosensitive resin composition layer and the photosensitive resin composition comprises a carboxylated binder polymer, a photopolymerizable compound having at least one polymerizable, ethylenically unsaturated group per molecule, and a photopolymerization initiator.</p>
申请公布号 WO0079344(A1) 申请公布日期 2000.12.28
申请号 WO2000JP04028 申请日期 2000.06.21
申请人 HITACHI CHEMICAL CO., LTD.;CHIBA, TATSUO;ICHIKAWA, TATSUYA 发明人 CHIBA, TATSUO;ICHIKAWA, TATSUYA
分类号 G03F7/027;G03F7/09;G03F7/11;(IPC1-7):G03F7/004;G03F7/033;H05K3/00 主分类号 G03F7/027
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