发明名称 |
PHOTOSENSITIVE ELEMENT, PHOTOSENSITIVE ELEMENT ROLL, PROCESS FOR PRODUCING RESIST PATTERN WITH THE SAME, RESIST PATTERN, SUBSTRATE WITH OVERLYING RESIST PATTERN, PROCESS FOR PRODUCING WIRING PATTERN, AND WIRING PATTERN |
摘要 |
<p>A photosensitive element comprising a biaxially oriented polyester film and a supporting film having a layer of a photosensitive resin composition formed on one side thereof, wherein the supporting film has a resin layer containing fine particles on the side opposite to the photosensitive resin composition layer and the photosensitive resin composition comprises a carboxylated binder polymer, a photopolymerizable compound having at least one polymerizable, ethylenically unsaturated group per molecule, and a photopolymerization initiator.</p> |
申请公布号 |
WO0079344(A1) |
申请公布日期 |
2000.12.28 |
申请号 |
WO2000JP04028 |
申请日期 |
2000.06.21 |
申请人 |
HITACHI CHEMICAL CO., LTD.;CHIBA, TATSUO;ICHIKAWA, TATSUYA |
发明人 |
CHIBA, TATSUO;ICHIKAWA, TATSUYA |
分类号 |
G03F7/027;G03F7/09;G03F7/11;(IPC1-7):G03F7/004;G03F7/033;H05K3/00 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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