发明名称 HIGH SURFACE AREA INSULATING FILMS
摘要 <p>The present invention provides a high surface area insulating film comprising a sheet of material (52), wherein the sheet material includes a first region (64) and a second region (66) being comprised of the same material composition. The first region (64) undergoes a substantially molecular-level deformation and the second region (66) initially undergoes a substantially geometric deformation when the sheet material is subjected to an applied elongation along at least one axis. The first region (64) and the second region (66) are visually distinct from one another, wherein the second region (66) includes a plurality of raised rib-like elements (74) and the first region (64) is substantially free of ribe-like elements (74).</p>
申请公布号 WO2000078530(A1) 申请公布日期 2000.12.28
申请号 US2000016960 申请日期 2000.06.16
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