| 摘要 |
<p>An electrode structure is provided for use in a plasma device that processes a workpiece (W) using a plasma in a process chamber (26) in a vacuum. An electrode (38) includes a heater (44). The electrode (38) is coupled to a cooling block (40) having a cooling jacket (58) for cooling the electrode. A heat-resistant metal sealant (66A, 66B) covers the electrode in a heat-transfer space (62, 64) formed between the electrode and the cooling block. Gas supply means (94) on the electrode side supplies a heat medium to the space (62, 64). Such an electrode structure maintains the electrode sealed in the space in a high temperature range above 200°C, even at 350 to 500°C, and prevents the gas leakage.</p> |
