发明名称 |
Apparatus and method for microwave plasma process |
摘要 |
The invention provides a microwave plasma process apparatus in which an antenna (11) having a tubular member (12a) curved in a C shape or a spiral shape and including a slit (15) is disposed on a sealing member (4) for sealing a chamber (1), so that a microwave can be emitted through the slit to the sealing member. <IMAGE> |
申请公布号 |
EP0911862(A3) |
申请公布日期 |
2000.12.27 |
申请号 |
EP19980119417 |
申请日期 |
1998.10.14 |
申请人 |
SUMITOMO METAL INDUSTRIES LIMITED |
发明人 |
MATSUMOTO, NAOKI;NAKANISHI, TOSHIO |
分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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