发明名称
摘要 A waiting space is provided below a processing vessel for processing objects to be processed. An objects to be processed mount which is movable up and down into the processing vessel is disposed in the waiting space for mounting objects to be processed. There is provided a natural oxide film generation suppressing gas supply system which supplies a natural oxide film generation suppressing gas for suppressing generation of natural oxide films on the surfaces of the objects to be processed, and a dried gas with a low dew point is supplied as a natural oxide film generation suppressing gas by the natural oxide film generation suppressing gas supply system. The processing apparatus can suppress generation of natural oxide films inexpensively and efficiently.
申请公布号 JP3120395(B2) 申请公布日期 2000.12.25
申请号 JP19930076174 申请日期 1993.03.10
申请人 发明人
分类号 H01L21/31;C23C16/44;C23C16/54;C30B25/14;H01L21/22 主分类号 H01L21/31
代理机构 代理人
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