发明名称 MODELLING ELECTRICAL CHARACTERISTICS OF THIN FILM TRANSISTORS
摘要 A device and automated method of calculating bulk states information and interface states information of a thin film transistor from a current-voltage measurement and a capacitance-voltage measurement comprising the steps of: calculating the flat band voltage from the input capacitance-voltage measurement; applying a general expression of Gauss's Law and the calculated flat band voltage to a capacitance voltage relationship which defines capacitance so as to calculate a relationship between gate surface potential and gate/source voltage; applying Gauss's Law to the calculated relationship between gate surface potential and gate/source voltage to thereby calculate and ouput the interface states; calculating conductance/gate voltage data from the current-voltage measurement using the calculated flat band voltage; conducting an initialisation process using the calculated conductance/gate voltage data and the calculated relationship between gate surface potential and gate/source voltage, said initialisation process using a conductance equation so as to calculate initialised values for the electron conductance at the flat band voltage, for the hole conductance at the flat band voltage, for a density of states function and for the Fermi Energy; conducting an iteration process based on Poisson's equation using the said initialised values calculated by the initialisation process and the calculated conductance/gate voltage data to thereby calculate and output the bulk states information.
申请公布号 WO0077834(A2) 申请公布日期 2000.12.21
申请号 WO2000GB02325 申请日期 2000.06.15
申请人 SEIKO EPSON CORPORATION;LUI, BASIL;MIGLIORATO, PIERO 发明人 LUI, BASIL;MIGLIORATO, PIERO
分类号 H01L29/00;G01R31/26;G01R31/28;G06F17/50;H01L29/786;(IPC1-7):H01L21/00 主分类号 H01L29/00
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