发明名称 OPTICAL VIEW PORT FOR CHEMICAL MECHANICAL PLANARIZATION ENDPOINT DETECTION
摘要 <p>A optical endpoint system for a CMP system with an optical viewport assembly (40) located off-center on the platen (4), the viewport being adjustable in height by height adjusting screws (57) so that the window (53) of the viewport can be made flush with the top of the polishing pad (7). Locking screws (58) maintain the vertical position of the window (53). An optical fiber bundle (31) is routed through the platen drive spool (8) to a rotary optical coupling (32).</p>
申请公布号 WO2000076725(A1) 申请公布日期 2000.12.21
申请号 US2000016026 申请日期 2000.06.10
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