| 发明名称 |
CONTROLLED-STRESS STABLE METALLIZATION FOR ELECTRONIC AND ELECTROMECHANICAL DEVICES |
| 摘要 |
A method of forming a thin film metallization layer having a predetermined residual stress and a predetermined sheet resistance and force measuring devices formed using the methods. |
| 申请公布号 |
WO0077839(A1) |
申请公布日期 |
2000.12.21 |
| 申请号 |
WO2000US16260 |
申请日期 |
2000.06.14 |
| 申请人 |
HONEYWELL INTERNATIONAL INC.;GOLECKI, ILAN |
发明人 |
GOLECKI, ILAN |
| 分类号 |
B81B3/00;B81C1/00;G01L1/18;G01P15/08;G01P15/097;G01P15/10;H01L21/285;H01L21/3205 |
主分类号 |
B81B3/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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