| 摘要 |
<p>A process for the abatement of trimethylvinylsilane (TMVS) by contacting a gas stream containing TMVS with copper(II) oxide (CuO) and/or manganese oxide (MnO2) in the presence of sufficient oxygen to prevent reduction of the oxides and at an oxide temperature of at least room temperature but in preferred embodiments of >100 deg. <IMAGE></p> |
