| 摘要 |
<p>A vacuum process system comprises: a vacuum process container (16) having therein a supporting table (22) for supporting thereon an object (a wafer) (1) to be processed; a presser member (a clamp-ring) (38) for pressing the top surface of the peripheral portion of the object (1) to fix the object (1) to the supporting table (22); and a shower head part (74) facing the supporting table (22). The shower head part (74) has a large number of gas nozzles (80, 80A) in the bottom face thereof. If the bottom face of the shower head part (74) is divided into a facing portion, which faces the presser member (38), and a non-facing portion other than the facing portion, the bottom face of the shower head part (74) is formed so that the gas injection quantity per unit area of the non-facing portion is substantially uniform and so that the gas injection quantity per unit area of the facing portion is greater than that of the non-facing portion. Such a construction is accomplished by, e.g., causing the diameters of the gas nozzles (80, 80A) to be different from each other. <IMAGE></p> |
