发明名称 Method and system for accurately marking the backside of the die for fault location isolation
摘要 A system and method for deprocessing a semiconductor die is disclosed. The semiconductor dies has an active area and at least one feature in the active area. The method and system include tuning an ablation laser. The method and system further include ablating a first portion of the semiconductor die using a tuned ablation laser to mark a location of the feature. The first portion is distinct from the active area and has a center. The center of the first portion is substantially above the feature. The method and system also include deprocessing a second portion of the semiconductor die using the first portion as a guide.
申请公布号 US6162651(A) 申请公布日期 2000.12.19
申请号 US19980153758 申请日期 1998.09.15
申请人 ADVANCED MICRO DEVICES, INC. 发明人 KHOSROPOUR, FRED
分类号 H01L21/00;H01L21/66;(IPC1-7):H01L21/00 主分类号 H01L21/00
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