| 摘要 |
PROBLEM TO BE SOLVED: To inspect a defect of a film formed on a substrate of a relatively rough surface by a light interferometer method. SOLUTION: Light with longer wavelength than surface roughness Rmax or Rz of a substrate that a film is formed is irradiated to the substrate. Thereby, a defect of the film formed is inspected by obtaining interference fringes 5, 6. Specially, it is preferable that light with wavelength 500 nm or above is irradiated when the Rmax or Rz is 0.5μm or above, or light with longer wavelength than Rmax or Rz over a range between Rmax and Rz is irradiated to the substrate. A surface of the substrate is cut. Specifically, defects of an electric discharge generating layer of an electrophotography photoreceptor 8, electric discharge transporting layer or undercoating layer can be inspected. This photoreceptor 8 is mounted on a digital copy machine and printer. Also, irradiating homogeneous light is preferable. Irradiating indirect light of light reflected by a reflector plate or light diffused by a diffuser plate is also preferable.
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