发明名称 PHOTOSENSITIVE MATERIAL FOR LITHOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive material for the lithographic printing plate capable of preventing poor printing due to existence of too much damping water (emulsification into water) at the time of printing in the case of using a diazo resin as a photosensitive component. SOLUTION: This photosensitive material for the lithographic printing plate is provided on a support with a photosensitive layer having (a) an alkali-soluble or alkali-swellable polymer compound, (b) a diazo resin, and (c) a polymer compound having a weight average molecular weight of 100,000-400,000 and structural units derived from a monomer represented by the formula: CH2=C(R1) COO-R2 in which R1 is an H atom or a methyl group, and R2 is a 8-16C alkyl group.
申请公布号 JP2000352818(A) 申请公布日期 2000.12.19
申请号 JP19960009227 申请日期 1996.01.23
申请人 MITSUBISHI CHEMICALS CORP;KONICA CORP 发明人 OTA KATSUKO;TSUJI SHIGEO;YOKOO TOSHIAKI;SASAKI MITSURU
分类号 G03F7/033;B41N1/14;G03F7/00 主分类号 G03F7/033
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