发明名称 FITTING METHOD FOR SHADOW MASK ASSEMBLY
摘要 PROBLEM TO BE SOLVED: To obtain an accurate interval (Q size) between a perforated shadow mask face and the inner face of a panel section faceplate arranged to face it by directly measuring the Q size, and adjusting the Q size based on the measured result. SOLUTION: A shadow mask assembly 2 is fitted in a panel section 1 through a first process that the perforated shadow mask face 3U of the shadow mask assembly 2 held by a position adjusting mechanism 5 is arranged to face a faceplate 1F in a fixed panel section 1, a second process that the interval (Q size) between the perforated shadow mask face 3U and the inner face of the faceplate 1F arranged to face it is directly measured by a distance measuring instrument, a third process that the position adjusting mechanism 5 is finely adjusted based on the measured result in the second process, and a fourth process that locking springs are fitted between support pins 7 protruded in the panel section 1 and the support frame 4 of the shadow mask assembly 2.
申请公布号 JP2000353470(A) 申请公布日期 2000.12.19
申请号 JP19990164314 申请日期 1999.06.10
申请人 HITACHI LTD;HITACHI CHIBA ELECTRONICS KK 发明人 OGISHIMA YOSHITOMO
分类号 H01J9/14;(IPC1-7):H01J9/14 主分类号 H01J9/14
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