发明名称 |
Mask blank and method of producing mask |
摘要 |
A shading film of chrome is formed entirely on one surface of a circular substrate of quartz. The substrate is rotated and resist is applied to the shading film. Since the substrate is shaped in a circle, the resist spreads uniformly on the entire surface of the shading film by the centrifugal force. Therefore, the resist has a substantially uniform film thickness over almost the entire surface of the shading film. This resist is patterned to form a resist pattern. By etching the shading film with the resist pattern used as a mask, a pattern preferable in accuracy of dimensions can be formed.
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申请公布号 |
US6162564(A) |
申请公布日期 |
2000.12.19 |
申请号 |
US19970978354 |
申请日期 |
1997.11.25 |
申请人 |
KABUSHIKI KAISHA TOSHIBA;SIEMENS MICROELECTRONICS, INC. |
发明人 |
HIEDA, KATSUHIKO;FISCHER, THOMAS;GRASSMANN, ANDREAS |
分类号 |
G03F1/08;G03F1/14;G03F7/16;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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