| 发明名称 |
Method for removing contaminants from integrated circuits |
| 摘要 |
A method for removing contaminants from integrated circuit devices. Particularly disclosed is a method for removing alkali metal and halogen-based contaminants from an integrated circuit device as the device is being fabricated.
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| 申请公布号 |
US6162733(A) |
申请公布日期 |
2000.12.19 |
| 申请号 |
US19990232120 |
申请日期 |
1999.01.15 |
| 申请人 |
LUCENT TECHNOLOGIES INC. |
发明人 |
OBENG, YAW SAMUEL |
| 分类号 |
H01L21/306;H01L21/3065;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
H01L21/306 |
| 代理机构 |
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| 主权项 |
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