发明名称 ERASING SYSTEM FOR NON-VOLATILE SEMICONDUCTOR MEMORY
摘要 <p>PROBLEM TO BE SOLVED: To prevent erroneous read-out by suppressing the variation of threshold voltage of a memory cell caused by disturbance of a substrate at the time of erasing operation. SOLUTION: At the time of erasing operation of a selection block BLOCK0, first positive voltage +3 V is applied to word lines WL32-WL63 of a non- selection block BLOCK1, while reference voltage 0 V is applied to sub-bit lines SBL11, SBL13,... SBL14095. A memory cell in which threshold voltage in the non-selection block BLOCK1 is low state is turned on, and a channel layer formed on the memory cell being turned on is made reference voltage 0 V. And the first positive voltage +3 V is applied to a control gate connected to the word lines WL32-WL63, potential difference between the control gate (+3 V) and the channel layer (0 V) is made small, an electric field between a floating gate and the channel layer is reduced, and a substrate disturbance is relaxed.</p>
申请公布号 JP2000353391(A) 申请公布日期 2000.12.19
申请号 JP19990163814 申请日期 1999.06.10
申请人 SHARP CORP 发明人 HIRANO YASUAKI
分类号 G11C16/02;G11C16/34;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):G11C16/02;H01L21/824 主分类号 G11C16/02
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