| 摘要 |
PROBLEM TO BE SOLVED: To provide a flatness measuring interferometer capable of highly accurately measuring flatness of a wafer that a dielectric substance film is formed. SOLUTION: The system a light source supplying light, a light dividing member FL dividing the light from the light source into measurement light and reference light, and an arithmetic processor PC computing flatness of a measured substrate W, which is placed in a medium M with a first refractive index and has a dielectric substance film D with a second refractive index, based on an interference fringe obtained by interfering the measurement light, which is entered into the measured substrate W at a predetermined incident angleθ1 and reflected, with the reference light.
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