发明名称 Method and apparatus for variably controlling the temperature in a selective deposition modeling environment
摘要 A method, system and apparatus for variably controlling the temperature in a selective deposition modeling environment. The temperature of the formed portion of the three-dimensional object is detected. A gas is forced onto a surface of the formed portion of the three-dimensional object. The forced gas has a characteristic, such as temperature and quantity, that is variably controlled based on the detected temperature of the formed portion of the three-dimensional object.
申请公布号 US6162378(A) 申请公布日期 2000.12.19
申请号 US19990257360 申请日期 1999.02.25
申请人 3D SYSTEMS, INC. 发明人 BEDAL, BRYAN J. L.;BROWN, JOE M.;STOCKWELL, JOHN;VAHIDKHAH, ANDISHEH
分类号 B29C35/04;B29C35/16;B29C41/08;B29C41/12;B29C41/52;B29C67/00;(IPC1-7):B29C41/02 主分类号 B29C35/04
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