发明名称 Resin composition for stereolithography
摘要 A resin composition for stereolithography and a process for producing a three-dimensional object using the same. The resin composition comprises (1) a liquid photohardenable resin composition containing at least one of photo-polymerizable compounds and a photosensitive polymerization initiator, and (2) at least one of radiation energy absorbers in an amount of from 0.001 to 1.0% by weight based on the total amount of the liquid photohardenable resin composition (1).
申请公布号 US6162576(A) 申请公布日期 2000.12.19
申请号 US19980032109 申请日期 1998.02.27
申请人 TEIJIN SEIKI CO., LTD. 发明人 HAGIWARA, TSUNEO;TAMURA, YORIKAZU
分类号 G03F7/004;B29C33/38;B29C35/08;B29C67/00;B29K33/00;B29K63/00;B29K105/24;C08F2/50;G03F7/00;G03F7/031;G03F7/09;(IPC1-7):G03F7/08;G03F7/26 主分类号 G03F7/004
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