发明名称 |
Resin composition for stereolithography |
摘要 |
A resin composition for stereolithography and a process for producing a three-dimensional object using the same. The resin composition comprises (1) a liquid photohardenable resin composition containing at least one of photo-polymerizable compounds and a photosensitive polymerization initiator, and (2) at least one of radiation energy absorbers in an amount of from 0.001 to 1.0% by weight based on the total amount of the liquid photohardenable resin composition (1).
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申请公布号 |
US6162576(A) |
申请公布日期 |
2000.12.19 |
申请号 |
US19980032109 |
申请日期 |
1998.02.27 |
申请人 |
TEIJIN SEIKI CO., LTD. |
发明人 |
HAGIWARA, TSUNEO;TAMURA, YORIKAZU |
分类号 |
G03F7/004;B29C33/38;B29C35/08;B29C67/00;B29K33/00;B29K63/00;B29K105/24;C08F2/50;G03F7/00;G03F7/031;G03F7/09;(IPC1-7):G03F7/08;G03F7/26 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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