发明名称 |
Spin coating bowl exhaust system |
摘要 |
An apparatus for exhausting coating materials used in the process of spin coating a top surface of a wafer, the wafer having an edge and a bottom surface that is supported and rotated by a rotatable chuck attached by a shaft to a spin motor. The apparatus includes a bowl having an exhausted drain configured to receive excess liquid and vapor from the spin coating and an assembly configured to maintain the drain at a negative pressure differential relative to the bowl. In a preferred embodiment, a baffle is attached to the bottom to limit the flow of the liquid and vapor into the drain to a predetermined direction.
|
申请公布号 |
US6162294(A) |
申请公布日期 |
2000.12.19 |
申请号 |
US19980102345 |
申请日期 |
1998.06.22 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
DAVIS, SHAWN D.;MOLEBASH, JOHN S.;HAYES, BRUCE L.;DAVLIN, JOHN T. |
分类号 |
B05C11/08;H01L21/00;(IPC1-7):B05C11/08 |
主分类号 |
B05C11/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|