发明名称 |
METHOD FOR MANUFACTURING A MICRO STRUCTURE |
摘要 |
PURPOSE: A method for manufacturing a micro structure is provided to decrease an actuation voltage of a side drive micro actuator to increase an actuation force and to increase a sensitivity of a capacitance-type sensor, by embodying a moving micro structure having a high aspect ratio by a selective plating. CONSTITUTION: A sacrificial layer having a predetermined shape is formed on a substrate having an insulating layer. A seed layer having a predetermined shape is formed on the sacrificial layer and insulating layer to expose a part of the sacrificial layer. A plating frame is formed on the exposed sacrificial layer. A metal layer is plated on the seed layer. The sacrificial layer and plating frame are eliminated.
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申请公布号 |
KR20000074405(A) |
申请公布日期 |
2000.12.15 |
申请号 |
KR19990018317 |
申请日期 |
1999.05.20 |
申请人 |
LG ELECTRONICS INC. |
发明人 |
KIM, GEUN HO;BOO, JONG UK;LEE, YEONG JU |
分类号 |
H01L21/283;(IPC1-7):H01L21/283 |
主分类号 |
H01L21/283 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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