发明名称 METHOD FOR MANUFACTURING A MICRO STRUCTURE
摘要 PURPOSE: A method for manufacturing a micro structure is provided to decrease an actuation voltage of a side drive micro actuator to increase an actuation force and to increase a sensitivity of a capacitance-type sensor, by embodying a moving micro structure having a high aspect ratio by a selective plating. CONSTITUTION: A sacrificial layer having a predetermined shape is formed on a substrate having an insulating layer. A seed layer having a predetermined shape is formed on the sacrificial layer and insulating layer to expose a part of the sacrificial layer. A plating frame is formed on the exposed sacrificial layer. A metal layer is plated on the seed layer. The sacrificial layer and plating frame are eliminated.
申请公布号 KR20000074405(A) 申请公布日期 2000.12.15
申请号 KR19990018317 申请日期 1999.05.20
申请人 LG ELECTRONICS INC. 发明人 KIM, GEUN HO;BOO, JONG UK;LEE, YEONG JU
分类号 H01L21/283;(IPC1-7):H01L21/283 主分类号 H01L21/283
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