| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device which is capable of transferring optical patterns in a high throughput to a substrate even if the patterns respectively varying in required resolution coexist. SOLUTION: This exposure device has a substrate stage on which is patterns are formed according to different design rules and on which the substrate is placed, a first exposure optical system 2A having the first resolution, a second exposure optical system 4A having the second resolution different from the first resolution and a control section for controlling the substrate stage, the first exposure optical system 2A and the second exposure optical system 4A. The first exposure optical system 2A and second exposure optical system 4A of the device described above are composed of any of a stepper system of high resolution and a mirror projection system of low resolution, a stepper system of high resolution and a stepper system of low resolution, or a mirror projection system of high resolution and a mirror projection system of low resolution.
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