| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive type photoresist composition having good compatibility with a resin when dissolved in an organic solvent, excellent in aging stability of the solution and excellent also in sensitivity and resolution to a short wavelength light source by incorporating a specified compound and a resin which has specified repeating units, is decomposed by the action of an acid and increases its alkali solubility. SOLUTION: The photoresist composition contains a compound of formula I or II which generates an acid when irradiated with active light or radiation and a resin which has specified repeating units of formula III, is decomposed by the action of the acid and increases its alkali solubility. In the formulae I and II, R1-R5 are each H, an alkyl which may have a substituent or the like, (a) is 1-5, (b) is 1-5, (1) is 1-5, (m) is 0-5 and (n) is 0-5. In the formula III, Rb1 is H, a halogen or a 1-4C linear or branched alkyl and Rb2-Rb4 are each H or hydroxyl. |
