BAKE OVEN SYSTEM FOR UNIFORMLY HEATING A SEMICONDUCTOR WAFER

摘要

PURPOSE: A bake oven system is provided to improve uniformity of a line width on a semiconductor wafer in a bake process and to increase yield of the semiconductor wafer, by uniformly transferring heat to the entire surface of the semiconductor wafer. CONSTITUTION: A bake oven system(200) for uniformly heating a semiconductor wafer(208) comprises a base(212) and a heat transfer unit. The base oven system has the semiconductor wafer in an inner space. The base has a surface on which the semiconductor wafer is placed, and a heater for heating the semiconductor wafer. The base is established in the inner space. The heat transfer unit uniformly transfers heat to the semiconductor wafer.