发明名称 PRODUCTION OF SPIN VALVE FILM AND PRODUCTION OF MAGNETORESISTIVE MAGNETIC HEAD
摘要 PROBLEM TO BE SOLVED: To make an antiferromagnetic film thinner and to minimize the degradation in characteristics by a heat treatment. SOLUTION: This process for producing the spin valve film formed by laminating a first magnetic film, a nonmagnetic film, a second magnetic film and the antiferromagnetic film formed by a Pt-Mn alloy consists in subjecting the antiferromagnetic film to the heat treatment within a range enclosed by four points; the point A (280 deg.C, 15 nm), point B (310 deg.C, 15 nm), point C (280 deg.C, 30 nm) and the point D (280 deg.C, 30 nm) in a graph with which the heat treatment temperature of the antiferromagnetic film is taken at the abscissa and the thickness of the antiferromagnetic film as the ordinate.
申请公布号 JP2000348313(A) 申请公布日期 2000.12.15
申请号 JP19990160112 申请日期 1999.06.07
申请人 SONY CORP 发明人 OGAWARA SHIGEHISA
分类号 G11B5/39;(IPC1-7):G11B5/39 主分类号 G11B5/39
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