RETICLE HAVING A MASK PATTERN FOR TEST FOR MONITORING A CRITICAL DIMENSION CONDITION

摘要

PURPOSE: A reticle having a mask pattern for test for monitoring a critical dimension condition is provided to overcome a resolution limit and to save manpower and physical resources used in evaluating the critical dimension condition, by precisely evaluating a critical dimension condition. CONSTITUTION: In a scribing region near a device formation region in which a mask pattern for a circuit of a semiconductor device, a mask pattern(24) for test wherein a critical dimension for each size for monitoring a critical dimension condition is splitted is embodied in a reticle(2).