发明名称 ROTATION SUPPRESSING STRUCTURE OF WAFER
摘要 <p>PROBLEM TO BE SOLVED: To provide the rotation suppressing structure of a wafer, wherein notches can be made to position within a specified range and the notches in the wafer can be effectively prevented suppressively from being positionally deviated greatly. SOLUTION: This rotation suppressing structure is the rotation suppressing structure of a wafer, wherein a wafer press 8 and rotation suppressing stoppers 13, which suppress the rotation of a wafer W to the circumferential direction of the wafer W using notches N in the outer prepheral parts of the wafer W, are provided. The wafer press 8 is constituted of a frame-shaped mounting plate 9 mounted on the inner surface of the ceiling of a cover body of a wafer housing container, and a plurality of elastic control pieces 11 respectively molded protuberantly under the lower parts of both side parts of this plate 9 and pressingly made contact with the outer peripheral edge parts opposing to each other of the wafer W. Each rotation suppressing stopper 13 is integrally molded protuberantly to the point part of each piece 11 and is insertedly engaged with each notch N notched in the wafer W. The rotation of the wafer W is suppressed in spite of vibrations or the like during the transportation of the wafer W, a plurality of the notches N can be grouped within a specified narrow range SD and the facilitation and the like of the work of an alignment of the notches N with each other can be expected.</p>
申请公布号 JP2000349135(A) 申请公布日期 2000.12.15
申请号 JP19990157093 申请日期 1999.06.03
申请人 SHIN ETSU POLYMER CO LTD;SHIN ETSU HANDOTAI CO LTD 发明人 TAKACHI MICHIO;HIROHATA TATSUAKI
分类号 B65D85/86;H01L21/673;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65D85/86
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