SUPPLY CONTROL SYSTEM OF COATING SOLVENT FOR SEMICONDUCTOR WAFER

摘要

PURPOSE: A supply control system of a coating solvent for semiconductor wafer is provided to control a process for injecting a solvent by detecting a shape of the solvent applied on a wafer. CONSTITUTION: A lamp(20) is installed at one side of a spinner(10) to form an observing area. A CCD camera(30) is installed at a position near to the lamp(20) to form a focus to the observing area. A nozzle(40) is installed at an upper portion of a wafer(W) to inject a solvent. A CCD controller(50) is connected with the CCD camera(30) in order to control of the lamp(20), check an initial contrast of the wafer(W), and detect the variation of contrast within the observing area. A main controller(60) controls operations of the lamp(20), the CCD camera(30), and the nozzle(40).