发明名称 |
ALIGN KEY FOR FORMING A CAPACITOR |
摘要 |
PURPOSE: An align key for forming a capacitor is provided to prevent a seam caused by a defective step coverage of an oxidation layer and to prevent the seam from being lifted after a cleaning process, by having the align key include a dot pattern and line patterns. CONSTITUTION: An alignment key for forming a capacitor includes a plurality of dot patterns. The plurality dot patterns are disposed to have a line shape, and the line-shaped dot patterns are arranged to have a box shape. The width of each dot pattern is of the scope from 0.3 to 0.5 micrometer.
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申请公布号 |
KR20000075236(A) |
申请公布日期 |
2000.12.15 |
申请号 |
KR19990019741 |
申请日期 |
1999.05.31 |
申请人 |
SAMSUNG ELECTRONICS CO, LTD. |
发明人 |
BAEK, IN GI |
分类号 |
H01L23/58;(IPC1-7):H01L23/58 |
主分类号 |
H01L23/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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