发明名称 ALIGNMENT POST OBTAINED BY PHOTOLITHOGRAPHY METHOD, DEVICE STRUCTURE OF LIQUID CRYSTAL DISPLAY PROVIDED WITH OPTICAL INTERFERENCE LAYER AND ITS FORMATION
摘要 PROBLEM TO BE SOLVED: To obtain a new method for forming an insulating material-made alignment post associated with an active element structure by forming a silicon wafer provided with active elements having patterns on the inside and outside and adhering the insulating material-made alignment post onto each pattern of the active element structure to form a pattern. SOLUTION: A transparent encircled body is obtained using a glass cover plate 10 to return light incident from the outside on a viewer by reflecting the light. The intensity of the reflected light is controlled by electric fields generated in liquid crystalline materials 11. An IC chip 12 separated from the glass plate by interposing an alignment post 14 generates such electric fields. The space formed as the result between the glass plate and the silicon wafer is filled with the selected liquid crystalline materials 11. Any of the supplied light and the light from the circumference is penetrated into the opened face of the liquid crystal on the silicon wafer and reflected on pixels disposed downward to form a polarized visible pattern.
申请公布号 JP2000347417(A) 申请公布日期 2000.12.15
申请号 JP20000060761 申请日期 2000.03.06
申请人 CHARTERED SEMICONDUCTOR MFG LTD 发明人 SUU YON JII;RAVI SANKAA YARAMANCHI;HAN CHII GYANGU
分类号 G02B1/11;G02F1/1335;G02F1/1339;G02F1/136;G02F1/1362;G03F7/20;G09F9/00 主分类号 G02B1/11
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