| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photoresist stripping agent substitutable for a hologenated hydrocarbon by incorporating a specified mass % of dimethylsulfoxide (DMSO) or N-methylpyrrolidone (NMP) and a specified mass % of 3-methoxypropylamine (MOPA) in the photoresist stripping agent. SOLUTION: A mixture is prepared by mixing 30-95 mass % DMSO or NMP with 70-5 mass % MOPA, preferably 65-95% DMSO or NMP with 35-5% MOPA. It is more preferable that the mixture contains about 70 wt.% DMSO and 30 wt.% MOPA. This DMSO-MOPA mixture or NMP-MOPA mixture can be used as it is for stripping the photoresist but it is advantageous that a small amount of water i.e., 0-10 parts water is added to the 100 parts DMSO-MOPA mixture or NMP-MOPA mixture. A small amount of antiseptic (for example, catechol) is advantageously added. |
