发明名称 SEMICONDUCTOR GAS RATE SENSOR
摘要 PROBLEM TO BE SOLVED: To reduce the limitation in deflection direction of gas flow so as to improve the detection sensitivity in a semiconductor gas rate sensor by forming a nozzle hole and a gas flow passage so that the gas flow may be perpendicular to a semiconductor substrate. SOLUTION: In a lower semiconductor substrate 1, a deep hole being a gas flow passage 4 is formed by a semiconductor fine work technique such as etching, and a protruding part is formed on the boottom surface, while a nozzle hole 3 is formed thereat by etching. On the substrate 1, an upper substrate 2 where a through hole being a gas flow passage 4 is formed, and two pairs of heat wires 51, 53 and 52, 54 are formed on its upper surface is superposed so that both the positions of the passages 4, 4 may correspond each other, and the two 1, 2 are bound. A semiconductor gas rate sensor is constructed in this way. The holes 3 an the passage 4 are formed so that gas flow may be perpendicular to the semiconductor substrates when no angle speed works. In such a constitution, the gas flow is jetted out toward the heat wires 51, 53 and 52, 54 from the nozzle hole 3 by operating a pump, and deflection of the gas flow when the angle speed is applied is detected by the heat wires.
申请公布号 JP2000346861(A) 申请公布日期 2000.12.15
申请号 JP19990158329 申请日期 1999.06.04
申请人 FUJI ELECTRIC CO LTD 发明人 KIKUCHI HIROTO
分类号 G01P9/00;G01C19/00;(IPC1-7):G01P9/00 主分类号 G01P9/00
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