| 摘要 |
PROBLEM TO BE SOLVED: To provide a bake furnace which can manufacture a wafer which is equal in line width by dissolving the inequality of the line width at the surface of a wafer where a developer is applied. SOLUTION: Heating of the wafer 12 within a bake furnace 11 is performed, using a plurality of heating heaters 13, 14, and 15 arranged concentrically. At that time, the temperature control of each heater is performed, using exclusive temperature controllers 16, 17, and 18, and the heating of a wafer is performed at different temperatures. The power of attack by the position and the power of this temperature are offset with each other, and a wafer having a photoresist equal in line width can be obtained. |
