| 摘要 |
<p>An exposure device aligns a mask with a workpiece by moving the mask if a work alignment mark goes out of the field of an alignment microscope. A striplike workpiece (Wb) is fed from a supply reel (R1) to a work stage (WS). An alignment microscope (2) is used for detection of the images of a mask mark (MAM) and a workpiece mark (WAM) to align a mask (M) with the striplike workpiece (Wb) before an exposure process. If the workpiece mark (WAM) is out of the field of the alignment microscope (2), the mask stage (MS) is moved, for example, spirally relative to the alignment microscope (2) to find the workpiece mark (WAM). When the workpiece mark (WAM) is detected, the mask (M) and the striplike workpiece (Wb) are aligned for an exposure process.</p> |
