发明名称 Substrate rotating mechanism, for a ceramic or metal deposition chamber, comprises bearing balls in grooves provided in two concentric annular disks and an interposed annular substrate holder
摘要 A substrate rotating mechanism comprises bearing balls running in grooves provided in two spaced-apart concentric annular disks and an interposed annular substrate holder. Substrate rotating mechanism, for a coating chamber, comprises: (a) two identical spaced-apart concentric annular disks with facing annular V-grooves; (b) an annular substrate holder having similar annular V-grooves in its two side faces and a toothed rim at its edge face; (c) low thermal conductivity balls which roll in the annular grooves and which contact each groove at no more than two points; (d) a bearing support provided on the annular disks for receiving the end of a drive shaft on which a drive screw is seated, the drive screw being is held in position by a spacer sleeve in the region of the bearing support such that it engages with the toothed rim; and (e) a holder arm attached to the annular disks for moving the mechanism perpendicularly to the rotational axis of the substrate holder.
申请公布号 DE19932338(C1) 申请公布日期 2000.12.14
申请号 DE19991032338 申请日期 1999.07.10
申请人 FORSCHUNGSZENTRUM KARLSRUHE GMBH 发明人 RATZEL, FRITZ
分类号 C23C14/50;(IPC1-7):C23C14/22;C23C16/44 主分类号 C23C14/50
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