发明名称 GATE VALVE FOR SEMICONDUCTOR PROCESSING SYSTEM
摘要 A gate valve (20) for semiconductor processing system includes a base frame (28) movable along a guide (26) toward and away from a valve seat (22) surrounding an opening (14). Disposed on the upper end of the guide (26) is a first stopper (56) that defines the limit of travel of the base frame (28) on the side of the valve seat (22). The base frame (28) has a swing frame (34) swingably attached thereto, with a valve seat (24) attached to the upper end thereof. The base frame (28) and swing frame (34) are interconnected by a link mechanism (36) capable of bending and stretching by being bent in the intermediate portion thereof, and by spring/damper member (46). The reciprocating rod (54) of an air actuator (52) is connected to an intermediary member (38) in the intermediate portion of the link mechanism (36).
申请公布号 WO0075542(A1) 申请公布日期 2000.12.14
申请号 WO2000JP03466 申请日期 2000.05.30
申请人 TOKYO ELECTRON LIMITED;OKA, HIROKI 发明人 OKA, HIROKI
分类号 F16K3/18;F16K51/02;(IPC1-7):F16K3/18 主分类号 F16K3/18
代理机构 代理人
主权项
地址