发明名称 |
GATE VALVE FOR SEMICONDUCTOR PROCESSING SYSTEM |
摘要 |
A gate valve (20) for semiconductor processing system includes a base frame (28) movable along a guide (26) toward and away from a valve seat (22) surrounding an opening (14). Disposed on the upper end of the guide (26) is a first stopper (56) that defines the limit of travel of the base frame (28) on the side of the valve seat (22). The base frame (28) has a swing frame (34) swingably attached thereto, with a valve seat (24) attached to the upper end thereof. The base frame (28) and swing frame (34) are interconnected by a link mechanism (36) capable of bending and stretching by being bent in the intermediate portion thereof, and by spring/damper member (46). The reciprocating rod (54) of an air actuator (52) is connected to an intermediary member (38) in the intermediate portion of the link mechanism (36).
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申请公布号 |
WO0075542(A1) |
申请公布日期 |
2000.12.14 |
申请号 |
WO2000JP03466 |
申请日期 |
2000.05.30 |
申请人 |
TOKYO ELECTRON LIMITED;OKA, HIROKI |
发明人 |
OKA, HIROKI |
分类号 |
F16K3/18;F16K51/02;(IPC1-7):F16K3/18 |
主分类号 |
F16K3/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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