Process for measuring the positioning errors of structured patterns used in semiconductor production comprises forming test grating structures, and measuring the light bent at the structures

摘要

Positioning errors of structured patterns are measured by forming test grating structures (4, 7) in at least one plane; measuring light bent at the structures; determining connection between bent light and positioning of both test lattice structures to each other by calibrating and simulating; and determining positioning errors using intensity measurement of bent light of bending level(s). Preferred Process: The test grating structure is produced by etching a metal layer, an insulating layer or a semiconductor.