发明名称 ELECTRON BEAM ANALYSIS DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To obtain an accurate detection output while correcting the change in a detector output due to the local change in the curvature of a sample surface. SOLUTION: The electron beam analysis device is provided with a correction data calculating means 13 for calculating the correction data correcting the detector output by using the normal direction at the sample analyzing point obtained from the surface shape data of the sample, and a correction means 14 for correcting the detector output by using the calculated correction data. The X-ray sensitivity is corrected on the basis of the X-ray radiation characteristic at the analytical point on the sample surface, so that an accurate X-ray analyzing result can be obtained independently of the change in the local curvature of the sample surface.</p>
申请公布号 JP2000346815(A) 申请公布日期 2000.12.15
申请号 JP19990162282 申请日期 1999.06.09
申请人 SHIMADZU CORP 发明人 NIWA NAOMASA
分类号 H01J37/22;G01N23/223;G01N23/225;H01J37/252;(IPC1-7):G01N23/223 主分类号 H01J37/22
代理机构 代理人
主权项
地址