发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
<p>A photosensitive resin composition comprising (a) a photosensitizer having in its structure 1,2-diazidonaphthoquinone structure, and a methylene-bridged structure composed of two or more methyl-substituted phenol derivatives, (b) a polymer having both hydroxyl group and carboxyl group, or a combination of a polymer having hydroxyl group and one having carboxyl group, (c) a crosslinking agent capable of crosslinking hydroxyl group and carboxyl group, and (d) a solvent. This composition can form highly transparent films, and, in addition, patterns having high contrast can be obtained when this composition is used as a photoresist.</p> |
申请公布号 |
EP1059564(A1) |
申请公布日期 |
2000.12.13 |
申请号 |
EP19990961329 |
申请日期 |
1999.12.22 |
申请人 |
CLARIANT INTERNATIONAL LTD. |
发明人 |
KURISAKI, MINORU;HARADA, TAKAMASA;KUDO, TAKANORI;TAKEDA, TAKASHI;FUKUZAWA, JUNICHI |
分类号 |
C08L33/04;H01L21/027;C08K5/41;C08L25/18;C08L101/06;G03F7/004;G03F7/038;G03F7/022;G03F7/023;G03F7/033;(IPC1-7):G03F7/022 |
主分类号 |
C08L33/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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