Magnet array for magnetrons

摘要

PCT No. PCT/GB97/00918 Sec. 371 Date Apr. 23, 1999 Sec. 102(e) Date Apr. 23, 1999 PCT Filed Apr. 2, 1997 PCT Pub. No. WO97/37371 PCT Pub. Date Oct. 9, 1997The invention relates to improvements and the formation of magnetrons for use in sputter depositing material from a targeted material mounted therein. The improvement allows contamination of the target to be reduced in comparison to those of conventional magnetrons, arcing of the magnetron to be reduced, and the deficiency and quality of the coating process and target utilization to be enhanced by providing an array of magnets around the periphery of the target in addition to a first array of magnets to the rear of the target, thus causing the effect of the magnetic field on the target to be substantially uniform.