发明名称 |
CHEMICAL-RESISTANT PRECISE FILTER CARTRIDGE POSSIBLE TO BE INCINERATED |
摘要 |
PROBLEM TO BE SOLVED: To provide a filter cartridge withstanding the high temp. filtering of a mixed soln. of hydrochloric acid and hydrogen peroxide affreviated to 'chloride-peroxide mixture' or isopropanel frequently used in a semiconductor producing process at 60-80 deg.C and easy in the incineration treatment of a used filter. SOLUTION: A microprous filter membrane 3 constituting a filter cartridge comprises aromatic polyaryl ether sulfone and all of filter cartridge constituting members excepting a detachable O-ring or gasket constituting the filter cartridge comprise a non-halogen substance. Precise filtering for filtering a mixed soln. of hydrochloric acid and hydrogen peroxide or isopropanol at 60-80 deg.C can be performed.
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申请公布号 |
JP2000342945(A) |
申请公布日期 |
2000.12.12 |
申请号 |
JP19990156797 |
申请日期 |
1999.06.03 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
OTANI SUMIO;OKADA HIDETAKA |
分类号 |
B01D71/76;B01D63/14;(IPC1-7):B01D71/76 |
主分类号 |
B01D71/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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