发明名称 FORMATION OF THIN FILM AND DEVICE THEREFOR
摘要 PROBLEM TO BE SOLVED: To form a thin film of a uniform thickness by composing a cylindrical holding space elongating in the horizontal direction of a spirally formed holding member and releasing a film forming stock from a vapor depositing source to the columnar, cylindrical or spiral object to be film-formed freely rotatably held in a space while rotating round a center axis of the space. SOLUTION: The object 1 to be film-formed is inserted into a holding member 2 for forming a thin film, i.e., into a cylindrical holding space. By the rotation of the holding member 2, the object 1 to be film-formed is held while being rotated on the lower side of the turn part of the holding member 2. Since the holding places are present every spiral pitch of the holding member 2, even in the case the object 1 to be film-formed is fine, insufficient in bending strength and easy to be deformed, this can be held horizontally and also in a rectilinear state, and the object 1 to be film-formed can smoothly be rotated in the holding space. Next, film forming particles are released from a vapor depositing source 3 toward the object 1 to be film-formed to form a thin film of a uniform thickness on the surface thereof.
申请公布号 JP2000345340(A) 申请公布日期 2000.12.12
申请号 JP19990156640 申请日期 1999.06.03
申请人 NEC CORP 发明人 UMEMOTO SHINICHI
分类号 C23C14/50;(IPC1-7):C23C14/50 主分类号 C23C14/50
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