发明名称 CURABLE COMPOSITION FOR FLATTENED FILM, AND FLATTENED FILM
摘要 PROBLEM TO BE SOLVED: To provide a curable composition which can form a highly flat, cured film even on a substrate having a low surface flatness and can form a cured film having a high surface hardness and excellent heat resistance, chemical resistance, etc., by compounding a (co)polymer containing structural units each having a glycidyl group with another epoxy resin and a compound which generates an acid by heat or radiation. SOLUTION: This curable composition comprises 100 pts.wt. (co)polymer containing at least 20 mol% structural units represented by formula I (wherein R1 is H or 1-5C alkyl; R2 is H or 1-2C alkyl; and m is 1-8) and having a wt. average mol.wt. of 3,000-300,000, 1-200 pts.wt. epoxy resin other than the (co)polymer, and 0.01-20 pts.wt. compound which generates an acid by heat or radiation, If necessary, the composition may further contain ingredients other than above-described. A solution of the composition is applied to the surface of a substrate, prebaked to remove a solvent to form a coating film, and baked to give a cured film.
申请公布号 JP2000344866(A) 申请公布日期 2000.12.12
申请号 JP19990158967 申请日期 1999.06.07
申请人 JSR CORP 发明人 TAKATORI MASASHIGE;ENDO MASAYUKI
分类号 G02B5/20;C08F20/32;C08G59/00;C08G59/32;C08G59/40;C08L63/00;C09D133/14;C09D163/00;G02F1/1333;G02F1/1335 主分类号 G02B5/20
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