| 摘要 |
PROBLEM TO BE SOLVED: To stably retain the posture of a vapor depositing material even in the case the vapor depositing material is heated at a high temp. equal to or above the m.p., as to the vapor depositing material, by allowing plural foot parts to hold the part to be heated so as to be mutually made close on the side of the part to be heated and allowing it to be supported by a supporting means so as to be mutually made away as it goes toward the supporting means. SOLUTION: A vapor depositing material 11 is composed of long-length members 21 and 22 arranged so as to be mutually contacted at the tip parts 21b and 22b located in the vicinity of a filament 13 and be mutually made away as they go toward the base edge parts 21a and 22a supported by a supporting stand 12. Vapor deposition is executed in such a manner that the tip parts 21b and 22b of the long-length members 21 and 22 are heated and melted. Thus, even in the case the vapor depositing material 11 is heated at a high temp. above the m.p., the remarkable retreat of the melted part of the vapor depositing material 11 in the direction far away from the filament 13 can be suppressed. In this way, even in the case Si, or the like, whose vapor pressure about the m.p. is low is used as the vapor depositing material 11, the vapor deposition is suitably executed, and film formation can be executed with high precision.
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