发明名称 Method of fabricating lateral power MOSFET having metal strap layer to reduce distributed resistance
摘要 To reduce the distributed resistance in an integrated circuit die, a relatively thick metal strap layer is deposited on a bus or other conductive path in the top metal layer. The metal strap layer is formed by etching a longitudinal channel in the passivation layer over the bus and plating a thick metal layer, preferably nickel, in the channel. The metal strap layer dramatically reduces the resistance of the bus.
申请公布号 US6159841(A) 申请公布日期 2000.12.12
申请号 US19990264602 申请日期 1999.03.08
申请人 SILICONIX INCORPORATED 发明人 WILLIAMS, RICHARD K.;KASEM, MOHAMMAD
分类号 H01L21/3205;H01L21/8234;H01L23/482;H01L23/52;H01L27/088;H01L29/10;H01L29/417;H01L29/78;(IPC1-7):H01L21/476 主分类号 H01L21/3205
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